Vanadium oxide has been grown in ultra high vacuum onto a rutile TiO2(100) surface and studied by X-ray photoelectron spectroscopy and atomic force microscopy. The AFM image showed a surface with a peculiar roughness made of three-dimensional structures having an average height of 10 nm and an average base radius of about 100 nm.
XPS and AFM characterization of a vanadium oxide film on TiO2(100) surface
CHIARELLO, Gennaro;BARBERI, Riccardo Cristoforo;CAPUTI, Lorenzo;
1996-01-01
Abstract
Vanadium oxide has been grown in ultra high vacuum onto a rutile TiO2(100) surface and studied by X-ray photoelectron spectroscopy and atomic force microscopy. The AFM image showed a surface with a peculiar roughness made of three-dimensional structures having an average height of 10 nm and an average base radius of about 100 nm.File in questo prodotto:
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