This paper reports on a comparative study of the electronic properties of ultra-thin film of NiO(100)/Ni(111) and graphene/Ni(111) intercalated with oxygen atoms. A way to combine a high quality CVD-grown graphene and a reduced interaction with the supporting substrate is to insert atomic species underneath carbon layer. Moreover, the intercalation of oxygen atoms allows, in some condition, to obtain graphene-insulating system, essential for a new generation of electronic devices. As a result of intercalation process, Electron Energy Loss Spectra reveal the presence of NiO islands underneath epitaxial graphitic layer and a dramatic change in the character of the energy dispersion curve of the graphene pi plasmon. (C) 2016 Elsevier Ltd. All rights reserved.
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