The damping processes of electronic collective excitations of Ag/Ni(1 1 1) were studied by high-resolution electron energy spectroscopy. The FMHM of the Ag surface plasmon was reported as a function of Ag thickness, primary electron beam energy, Ag surface plasmon energy, and parallel momentum transfer. The broadening of the Ag surface plasmon was found to be related to 5sp-5sp transitions, for which a critical wave vector of 0.2 angstrom(-1) exists. Moreover, we provide a direct evidence of the occurrence of chemical interface damping in thin films, upon doping the Ag/Ni(1 1 1) system with K adatoms. The enhanced plasmon broadening in K/Ag/Ni(1 1 1) was ascribed to the existence of additional electron-hole decay channels at the K/Ag interface. (C) 2009 Elsevier B.V. All rights reserved.

Damping of the surface plasmon in clean and K-modified Ag thin films

FORMOSO, Vincenzo;CHIARELLO, Gennaro
2009

Abstract

The damping processes of electronic collective excitations of Ag/Ni(1 1 1) were studied by high-resolution electron energy spectroscopy. The FMHM of the Ag surface plasmon was reported as a function of Ag thickness, primary electron beam energy, Ag surface plasmon energy, and parallel momentum transfer. The broadening of the Ag surface plasmon was found to be related to 5sp-5sp transitions, for which a critical wave vector of 0.2 angstrom(-1) exists. Moreover, we provide a direct evidence of the occurrence of chemical interface damping in thin films, upon doping the Ag/Ni(1 1 1) system with K adatoms. The enhanced plasmon broadening in K/Ag/Ni(1 1 1) was ascribed to the existence of additional electron-hole decay channels at the K/Ag interface. (C) 2009 Elsevier B.V. All rights reserved.
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/20.500.11770/156842
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