Thin films of mixed Ta and Re oxides have been produced by reactive dc magnetron co-sputtering of pure Ta and Re metal targets in Ar-O2atmosphere. The structural evolution of these films has been studied as a function of the composition, starting from a pure tantalum oxide film up to about 82% rhenium content. The composition and the structure of the films have been investigated by using X-ray diffraction and micro-Raman spectroscopy. For low Re content (20%), islands of a well crystallized phase, based on ReO4groups, appear in the films still composed by pure amorphous tantalum oxide, while a mixed disordered solid phase is found for the highest Re concentration (82%). © 2006 Elsevier B.V. All rights reserved.
Structural characterization of mixed Ta-Re oxide films
Cazzanelli, E.;Castriota, M.
2006-01-01
Abstract
Thin films of mixed Ta and Re oxides have been produced by reactive dc magnetron co-sputtering of pure Ta and Re metal targets in Ar-O2atmosphere. The structural evolution of these films has been studied as a function of the composition, starting from a pure tantalum oxide film up to about 82% rhenium content. The composition and the structure of the films have been investigated by using X-ray diffraction and micro-Raman spectroscopy. For low Re content (20%), islands of a well crystallized phase, based on ReO4groups, appear in the films still composed by pure amorphous tantalum oxide, while a mixed disordered solid phase is found for the highest Re concentration (82%). © 2006 Elsevier B.V. All rights reserved.I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
