STT-MRAMs have emerged as the leading candidate of on-chip technology for nonvolatile cache applications. In this paper, DMTJs are used to build STT-MRAMs at the circuit level with a reduced switching current benchmarking the TFET technology model and a calibrated 10nm-FinFET technology model to explore the best configuration in the ultralow voltage domain for writing operation in terms of energy-efficiency and area. Simulation results showed that the TFET-based solutions are the most energy-efficiency in terms of the EDP index with an average EDP 57.77% lower than the FinFET-based configurations. TFET-based bitcells had a 40.23% smaller delay and 34.11% less writing energy compared to the FinFET counterparts. Finally, a standby power analysis was carried out.

Performance Benchmarking of FinFET- and TFET-Based STT-MRAM Bitcells Operating at Ultra-Low Voltages

Taco Ramiro.
2023-01-01

Abstract

STT-MRAMs have emerged as the leading candidate of on-chip technology for nonvolatile cache applications. In this paper, DMTJs are used to build STT-MRAMs at the circuit level with a reduced switching current benchmarking the TFET technology model and a calibrated 10nm-FinFET technology model to explore the best configuration in the ultralow voltage domain for writing operation in terms of energy-efficiency and area. Simulation results showed that the TFET-based solutions are the most energy-efficiency in terms of the EDP index with an average EDP 57.77% lower than the FinFET-based configurations. TFET-based bitcells had a 40.23% smaller delay and 34.11% less writing energy compared to the FinFET counterparts. Finally, a standby power analysis was carried out.
2023
DMTJ
Fin-FET
leakage current
Magnetic Tunnel Junction
MTJ
Spintronics
STT-MRAM
TFET
Tunnel FET
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.11770/376198
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