Process variations cause unpredictability in speed and power characteristics of nanometer CMOS circuits impacting the timing and energy yields. In this paper, transistor reordering and dual-Vth techniques are evaluated regarding their efficiency in mitigating the impact of process variations on a set of pulsed flip-flops. It is shown that the conjunct use of the above mentioned techniques can improve delay, energy and EDP yields more than 1.98X, 1.62X and 1.99X times, respectively. The yield optimized flip-flop circuits are also comparatively analyzed to identify the best topologies.

Impact of process variations on pulsed flip-flops: Yield improving circuit-level techniques and comparative analysis

LANUZZA, Marco;DE ROSE R;FRUSTACI F;PERRI S;CORSONELLO, Pasquale
2011-01-01

Abstract

Process variations cause unpredictability in speed and power characteristics of nanometer CMOS circuits impacting the timing and energy yields. In this paper, transistor reordering and dual-Vth techniques are evaluated regarding their efficiency in mitigating the impact of process variations on a set of pulsed flip-flops. It is shown that the conjunct use of the above mentioned techniques can improve delay, energy and EDP yields more than 1.98X, 1.62X and 1.99X times, respectively. The yield optimized flip-flop circuits are also comparatively analyzed to identify the best topologies.
2011
3642177514
File in questo prodotto:
Non ci sono file associati a questo prodotto.

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/20.500.11770/180245
 Attenzione

Attenzione! I dati visualizzati non sono stati sottoposti a validazione da parte dell'ateneo

Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 14
  • ???jsp.display-item.citation.isi??? 10
social impact